SEMICONDUCTOR DEVICE HAVING VERTICAL CHANNEL TRANSISTOR AND MANUFACTURING METHOD OF THE SAME

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United States of America Patent

SERIAL NO

13717658

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Abstract

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A semiconductor device having a vertical channel transistor and a method for manufacturing the same are provided. In the semiconductor device, a metal bit line is formed between vertical channel transistors, and the metal bit line is connected to only one of the vertical channel transistors through an asymmetric bit line contact. Through such a structure, the resistance of the bit line can be improved and the process margin for formation of the bit line can be secured.

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Patent Owner(s)

Patent OwnerAddress
HYNIX SEMICONDUCTOR INCGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SUNG, Min Chul Seoul, KR 17 40

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