ETCHING SOLUTION AND METHOD OF MANUFACTURING PRINTED WIRING SUBSTRATE USING THE SAME

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United States of America Patent

APP PUB NO 20130175238A1
SERIAL NO

13474335

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Abstract

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This invention relates to an etching solution including hydrogen peroxide, sulfuric acid, chlorine ions, benzotriazole and pyrazole, and to a method of manufacturing a printed wiring substrate wherein the surface of the metal wiring of the printed wiring substrate is treated with an alkali solution, roughened using the etching solution and then subjected to anti-rust treatment, thus forming porous surface irregularities and micro anchors even with a small etching amount of the metal (Cu) to thereby obtain a high force of adhesion between the metal and an insulating material.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRO-MECHANICS CO LTDGYEONGGI DO KOREA SUWON SUWON GYEONGGI-DO
MITSUBISHI GAS CHEMICAL COMPANY INCCHIYODA-KU
SAMYOUNG PURE CHEMICALS CO LTD22 5SANDAN 1-RO SEONGNAM-MYEON DONGNAM-GU CHUNGCHEONGNAM-DO CHEONAN-SI 31245

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHOI, Cheol Ho Gyunggi-do, KR 34 165
HONG, Dae Jo Gyunggi-do, KR 11 21
HONG, Sung Pyo Ulsan, KR 31 216
HOSOMI, Akira Tokyo, JP 10 36
JEON, Jong Hoon Ulsan, KR 5 22
LEE, Chang Bo Gyunggi-do, KR 19 39
RYU, Chang Sup Gyunggi-do, KR 62 573
TAKAMIYA, Hiroshi Tokyo, JP 5 53

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