PROCESS FOR ALTERING THE WETTING PROPERTIES OF A SUBSTRATE SURFACE
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United States of America Patent
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Issued Date -
Jul 4, 2013
app pub date -
Sep 13, 2011
filing date -
Sep 13, 2010
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Abandoned
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Abstract
Methods for altering the wetting property of the surface of a substrate are disclosed. The methods can include the step of
- providing an array of nanostructures on the substrate, each nanostructure having a proximal end adjacent to the substrate and a distal end opposite to the proximal end. The methods can also include the step of moving the distal ends of at least one subset of the array of nanostructures towards each other to form at least one nanostructure cluster. The nanostructures of each cluster have distal ends that are spaced closer to each other relative to the respective proximal ends of the adjacent nanostructures, the nanostructure cluster altering the wetting property of the substrate.
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