DEVICE AND METHOD FOR FORMATION OF VESICLES
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United States of America Patent
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Issued Date -
Jul 4, 2013
app pub date -
Jan 3, 2013
filing date -
Jan 4, 2012
priority date (Note) -
Abandoned
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Abstract
A device and method for the formation of vesicles is disclosed herein. The device comprises a fluid introduction zone and a vesicle formation zone. The fluid introduction zone comprises a first inlet and a second inlet configured and disposed to provide parallel flow of an outer flow stream, flowing from the first inlet, sheathing an inner flow stream, flowing from the second inlet. The vesicle formation zone is configured and disposed to receive the parallel flow of the outer flow stream sheathing the inner flow stream and configured for a controlled and substantially uniform dispersion of an organic material, flowing in the inner flow stream, at a plane perpendicular to the vesicle formation zone.
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