ADAPTER FOR COUPLING A DIFFUSION FURNACE SYSTEM

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United States of America Patent

APP PUB NO 20130168377A1
SERIAL NO

13339757

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Abstract

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An adapter is provided for fluidly coupling a process chamber, such as a diffusion furnace or a process tube, and a fluid source, such as a torch chamber or combustion chamber, of a system for processing semiconductor material. The process tube and the torch chamber include joint segments that can engage directly together to fluidly couple the torch chamber to the process tube for introducing a fluid, such as an oxidizing gas or vapor, into the process tube. The process chamber and the torch chamber are formed of materials having different rates of thermal expansion. The adapter is configured to couple the joint segments of the torch chamber and the process tube while accommodating the differences in thermal expansion between the materials. The adapter may be formed of quartz to couple a quartz torch chamber with a silicon carbide process tube.

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Patent Owner(s)

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STMICROELECTRONICS PTE LTDSINGAPORE

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  • 2011 Application Filing Year
  • B23P Class
  • 3713 Applications Filed
  • 656 Patents Issued To-Date
  • 17.67 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2011201220132014201520162017201820192020202120220255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liang, Ying Shun Singapore, SG 1 0
McKee, Samuel Gordon Sengkang, SG 1 0

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges67408489411231101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 90100 +0255075100125150175200225250275300325350375400425450

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