VAPOR PHASE GROWTH APPARATUS
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United States of America Patent
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Issued Date -
Jul 4, 2013
app pub date -
Jan 30, 2012
filing date -
Mar 9, 2011
priority date (Note) -
Abandoned
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Abstract
A vapor phase growth apparatus with a measuring means which can measure the state of the warpage of a substrate, which is a rotation/revolution type vapor phase growth apparatus with a susceptor and a plurality of substrate retaining members in a chamber, wherein a measuring means comprising a laser source which continuously emits a laser light in a direction perpendicular to the surface of the substrate which is retained in the substrate retaining member and is rotating/revolving by the rotation of the susceptor and a light receiving portion which receives a laser light reflected on the surface of the substrate is fixed on the outer surface of a laser transparent portion provided on the chamber; and a judging means which judges that the substrate is in an abnormal state when the variation of the reflected light received by the light receiving portion is larger than a preset variation is provided.
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