Drawing apparatus, and method of manufacturing article
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United States of America Patent
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Jul 15, 2014
Grant Date -
Jun 27, 2013
app pub date -
Dec 5, 2012
filing date -
Dec 27, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit pattern to be drawn on the substrate, and mark data representing a mark to be drawn on the substrate, the apparatus including an obtaining unit configured to obtain information associated with a positioning accuracy of the charged particle beam relative to the substrate, a determination unit configured to determine a drawing region for the mark based on the obtained information, and a generation unit configured to generate the drawing data by combining the pattern data and the mark data such that the mark is drawn in the determined drawing region.
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