Inspection Method and Apparatus, and Lithographic Apparatus
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United States of America Patent
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Issued Date -
Jun 27, 2013
app pub date -
Jun 26, 2012
filing date -
Jul 20, 2011
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Abandoned
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Abstract
An inspection method reflects radiation with a known polarization beam off a periodic structure, such as a grating. The reflected radiation beam is split into first and second orthogonally polarized sub-beams. The phase of the first sub-beams is shifted with respect to the second sub-beam. A first image resultant from the first sub-beam and a second image resultant from the second sub-beam are simultaneously detected. A difference in intensity values is used to derived from the detected first and second images together to determine an overlay error in the periodic structure.
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