Method for Polymer Plasma Deposition
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United States of America Patent
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Issued Date -
Jun 20, 2013
app pub date -
Jul 12, 2011
filing date -
Jul 12, 2010
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Abandoned
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Abstract
The present invention is related to a method or the deposition of a chlorinated polymeric layer onto a ubstrate, said method comprising the steps of:—generating a plasma in a gaseous medium by means of a plasma device;—placing the substrate in contact with the plasma, or in the post-plasma area;—introducing in said plasma or in the post-plasma area a chlorinated precursor of the chlorinated polymer.
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