OPTICAL SYSTEM AND METHOD FOR INSPECTION OF PATTERNED SAMPLES
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United States of America Patent
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Issued Date -
Jun 13, 2013
app pub date -
Dec 12, 2011
filing date -
Dec 12, 2011
priority date (Note) -
Abandoned
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Abstract
An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination channel of a predetermined numerical aperture and first predetermined angular orientation with respect to the inspection plane, and a light collection unit defining a collection channel of second predetermined angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and defining an illumination pupil comprising a first pattern formed by at least one elongated light transmitting region having a physical dimension along one axis larger than along a perpendicular axis. The light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane, the collection mask comprising a second predetermined pattern of spaced-apart light blocking regions.
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