RESISTS FOR LITHOGRAPHY
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United States of America Patent
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Issued Date -
May 30, 2013
app pub date -
Jan 23, 2013
filing date -
Jul 10, 2006
priority date (Note) -
Abandoned
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Abstract
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
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