Fiber Delivery for Metrology Systems Used in Lithography Tools
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United States of America Patent
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Issued Date -
May 23, 2013
app pub date -
Nov 8, 2012
filing date -
Nov 9, 2011
priority date (Note) -
Abandoned
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Abstract
Metrology system, apparatus and method used to implement measurements inside a lithography tool are described, such that the disclosed measurements can be performed without contributing outgassed effluent within the lithography tool. Disclosed is a system including: an objective for projecting an image of an object positioned at an object plane to an image plane; a stage to execute motions relative to the objective while supporting the wafer at the image plane; an optical sensor for producing an optical monitoring signal associated with the motions of the stage; and a glass optical fiber having a metal outer coating, the metal-coated glass optical fiber being arranged to provide light to, or collect light from, the optical sensor.
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