Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties
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United States of America Patent
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Jul 19, 2016
Grant Date -
May 16, 2013
app pub date -
Nov 14, 2012
filing date -
Nov 16, 2011
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Abstract
A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase.
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