ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAME

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United States of America Patent

APP PUB NO 20130115733A1
SERIAL NO

13547783

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is an etchant composition. The etchant composition according to an exemplary embodiment of the present invention includes ammonium persulfate ((NH4)2)S2O8, an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, and water.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTD95 SAMSUNG 2 RO GIHEUNG-GU YONGIN-CITY GYEONGGI-DO
DONGJIN SEMICHEM CO LTD644 BAEKBEOM-RO SEO-KU INCHEON 404-817

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHO, Sam-Young Anyang-si, KR 14 123
CHOI, Jeong-Heon Cheongju-si, KR 1 3
CHOI, Shin Il Hwaseong-si, KR 50 135
KIM, Bong-Kyun Hwaseong-si, KR 67 528
KIM, Sang-Woo Seongnam-si, KR 158 1538
LEE, Dae-Woo Seoul, KR 72 573
LEE, Ki-Beom Seoul, KR 44 210
LEE, Wang Woo Suwon-si, KR 44 182
PARK, Hong Sick Suwon-si, KR 46 191
PARK, Young Woo Seoul, KR 106 700

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