ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAME

United States of America Patent

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Issued Date
May 9, 2013
app pub date
Jul 12, 2012
filing date
Nov 8, 2011

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Abandoned

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Abstract

Provided is an etchant composition. The etchant composition according to an exemplary embodiment of the present invention includes ammonium persulfate ((NH₄)₂)S₂O₈, an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, and water.

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Patent Owner(s)

Patent Owner	Address
SAMSUNG DISPLAY CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO
DONGJIN SEMICHEM CO LTD	INCHON SOUTH KOREA INCHEON

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
CHO, Sam-Young	Anyang-si, KR	14	123
CHOI, Jeong-Heon	Cheongju-si, KR	1	3
CHOI, Shin Il	Hwaseong-si, KR	50	135
KIM, Bong-Kyun	Hwaseong-si, KR	67	528
KIM, Sang-Woo	Seongnam-si, KR	158	1538
LEE, Dae-Woo	Seoul, KR	72	573
LEE, Ki-Beom	Seoul, KR	44	210
LEE, Wang Woo	Suwon-si, KR	44	182
PARK, Hong Sick	Suwon-si, KR	46	191
PARK, Young Woo	Seoul, KR	106	700

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ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13547783

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13547783

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Abstract

First Claim

Family

Patent Owner(s)

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