HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION
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United States of America Patent
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Issued Date -
May 2, 2013
app pub date -
Oct 26, 2011
filing date -
Oct 26, 2011
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Abstract
The disclosure relates to a method of depositing amorphous carbon on a substrate using at least one carbon containing molecule having at least one carbon atom the method comprising the steps of supplying the carbon containing molecule and carrying out the deposition to thereby form a deposited amorphous carbon on the substrate, wherein a carbon to hydrogen ratio of the molecule is equal to or more than 0.7.
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