METHOD OF TOPOGRAPHICAL AND ELECTRICAL NANOSTRUCTURATION OF A THIN FILM OF ELECTRET POLYMER AND THIN FILM OF ELECTRET POLYMER OBTAINED
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United States of America Patent
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Issued Date -
May 2, 2013
app pub date -
Apr 22, 2011
filing date -
May 7, 2010
priority date (Note) -
Abandoned
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Abstract
A method of nano-structuration of a thin film of electret polymer, called “electric nano-impression” method, in which a surface of a mould, called the structuration surface, including nanometric relief patterns, is placed in contact with at least one part of a free surface, called the treated surface of the thin film of electret polymer, nanometric patterns are formed, corresponding to the negative of the structuration patterns of the mould, in the thin film of electret polymer, by exerting a pressure of the structuration surface on the surface of the thin film of electret polymer, an electric voltage is applied between the structuration surface and the rear face of the film for a predetermined duration T2 suitable for inducing, after removal of the electric voltage applied, a differential distribution of electrostatic charges between the tops and the bottoms of the nanometric patterns formed in the thin electret polymer film.
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