SEMICONDUCTOR PACKAGE AND METHOD FOR MAKING THE SAME

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United States of America Patent

SERIAL NO

13712410

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a semiconductor package and a method for making the same. The method includes the steps of: (a) providing a base material; (b) forming a first metal layer on the base material, wherein the first metal layer comprises a first inductor and a first lower electrode; (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED SEMICONDUCTOR ENGINEERING INC26 CHIN 3RD RD NANZIH DIST KAOHSIUNG 811

International Classification(s)

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  • 2012 Application Filing Year
  • H01L Class
  • 20465 Applications Filed
  • 18077 Patents Issued To-Date
  • 88.34 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20122013201420152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chien-Hua Kaohsiung, TW 409 3027
Lee, Teck-Chong Kaohsiung, TW 54 228

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Patent Citation Ranking

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  • H01L Class
  • 0 % this patent is cited more than
  • 12 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges4074140169277539225214911984534318001 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0250500750100012501500175020002250250027503000325035003750400042504500

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