METHODS AND APPARATUS FOR THE CLOSED-LOOP FEEDBACK CONTROL OF THE PRINTING OF A MULTILAYER PATTERN
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United States of America Patent
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Issued Date -
Apr 25, 2013
app pub date -
Oct 23, 2012
filing date -
Oct 24, 2011
priority date (Note) -
Abandoned
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Abstract
Embodiments of the present invention provide apparatus and methods for closed-loop control utilized in printing a multilayer pattern on a substrate. In one embodiment, a solar cell formation process is provided. The process comprises positioning a substrate on a substrate receiving surface of a printing station, printing a first patterned layer on a region of the substrate, acquiring a first optical image of the first patterned layer and storing the first optical image in a buffer, printing a second patterned layer over the region of the substrate, wherein the second patterned layer is aligned over the region of the substrate using information received from the acquired first optical image.
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