CROSS-LINKING AND MULTI-PHASE ETCH PASTES FOR HIGH RESOLUTION FEATURE PATTERNING
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United States of America Patent
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Issued Date -
Apr 18, 2013
app pub date -
May 17, 2011
filing date -
Jun 14, 2010
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Abandoned
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Abstract
The present invention relates to a novel etching media in the form of printable, homogeneous etching pastes with non-Newtonian flow properties for the improved etching of inorganic oxides and silicon surfaces and which allow to prepare smaller features.
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