Forming a bridging feature using chromeless phase-shift lithography
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United States of America Patent
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Dec 10, 2013
Grant Date -
Apr 11, 2013
app pub date -
Oct 7, 2011
filing date -
Oct 7, 2011
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Abstract
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the chromeless photolithography process. A distance between the anchor features is sufficient to minimize lateral displacement at a center portion of the bridging feature without significant reduction in mechanical stability of the bridging feature.
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