PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE NICKEL PRECURSORS
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United States of America Patent
Stats
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N/A
Issued Date -
Apr 11, 2013
app pub date -
Oct 7, 2011
filing date -
Oct 7, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The disclosure relates to a process for depositing a Nickel or Cobalt containing film comprising the step of providing a metal guanidinate and/or metal amidinate precursor, suitable for plasma deposition at temperature equal or lower than 500 degrees C., to a plasma deposition process comprising a deposition temperature equal or lower than 500 degrees C.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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AMERICAN AIR LIQUIDE INC | 46409 LANDING PARKWAY FREMONT CA 94538 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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DUSSARRAT, Christian | Wilmington, US | 139 | 7373 |
# of filed Patents : 139 Total Citations : 7373 | |||
LANSALOT-MATRAS, Clement | Tsukuba, JP | 21 | 80 |
# of filed Patents : 21 Total Citations : 80 | |||
OMARJEE, Vincent M | Grenoble, FR | 29 | 485 |
# of filed Patents : 29 Total Citations : 485 |
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Patent Citation Ranking
- 2 Citation Count
- C23C Class
- 7.13 % this patent is cited more than
- 12 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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