METHOD OF FORMING A PATTERN ON THE SURFACE OF A SUBSTRATE
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United States of America Patent
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Issued Date -
Mar 21, 2013
app pub date -
Mar 15, 2011
filing date -
Mar 18, 2010
priority date (Note) -
Abandoned
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Abstract
A method of forming a pattern on the surface made of a hydrophobic macromolecular material of a substrate is provided, the method having a step of immersing at least said surface of the substrate in a solution that having at least 50% by volume of water and, optionally, one or more polar solvents having a dielectric constant greater than 30 and contains less than 0.0001 mol/L of dissolved gases and on source. The invention is particularly applicable in the electronics field.
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