Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography
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United States of America Patent
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Issued Date -
Mar 21, 2013
app pub date -
Sep 19, 2011
filing date -
Sep 19, 2011
priority date (Note) -
Abandoned
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Abstract
A method and system for optimization of an image to be printed on a substrate using optical lithography is disclosed in which a set of charged particle beam shots, some of which overlap, is determined so as to form a target pattern on a surface such as a reticle. The charged particle beam shots are simulated to determine the pattern that would be formed on the surface. Next, a substrate image is calculated from the simulated surface pattern. One or more shots in the set of shots are then modified to improve the calculated substrate image.
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