Crystal producing apparatus, crystal producing method, substrate producing method, gallium nitride crystal, and gallium nitride substrate

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United States of America Patent

PATENT NO 8829530
APP PUB NO 20130069078A1
SERIAL NO

13678880

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Abstract

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A crystal producing apparatus includes a crystal forming unit and a crystal growing unit. The crystal forming unit forms a first gallium nitride (GaN) crystal by supplying nitride gas into melt mixture containing metal sodium (Na) and metal gallium (Ga). The first GaN crystal is sliced and polished to form GaN wafers. The crystal growing unit grows a second GaN crystal on a substrate formed by using a GaN wafer, by the hydride vapor phase epitaxy method, thus producing a bulked GaN crystal.

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Patent Owner(s)

Patent OwnerAddress
RICOH COMPANY LTD3-6 NAKAMAGOME 1-CHOME OHTA-KU TOKYO 143-8555

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Iwata, Hirokazu Miyagi, JP 59 754
Sarayama, Seiji Miyagi, JP 54 542

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