GAS ABATEMENT SYSTEM
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United States of America Patent
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Issued Date -
Mar 14, 2013
app pub date -
Apr 27, 2011
filing date -
Jun 21, 2010
priority date (Note) -
Abandoned
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Abstract
Provided is a gas abatement system including piping. This system can be made overall more compact, with better serviceability, and at a lower cost. A gas abatement system is provided with: a water-cooled combustion-type abatement apparatus that performs combustion decomposition and scrub dust collection on gases to be processed that include silane, which is a semiconductor material gas, as well as a gaseous fluoride such as NF3, CF4, C2F6, SF6, CHF3 or CF6, that is used as a cleaning gas, for instance, in plasma cleaning of air-tight chambers C1, C2 . . . Cn of a plasma CVD apparatus or the like; an electrostatic precipitator that performs electric dust collection on the processed gas after performing combustion decomposition and scrub dust collection; and a pipe that feeds the processed gas after electric dust collection to a plant scrubber facility.
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