CRYSTALLINE FILM, DEVICE, AND MANUFACTURING METHODS FOR CRYSTALLINE FILM AND DEVICE
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United States of America Patent
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Issued Date -
Mar 14, 2013
app pub date -
Mar 4, 2011
filing date -
Mar 5, 2010
priority date (Note) -
Abandoned
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Abstract
Provided are a crystalline film in which variations in the crystal axis angle after separation from a substrate for epitaxial growth have been eliminated, and various devices in which the properties thereof have been improved by including the crystalline film. And the crystalline film has a thickness of 300 μm or more and 10 mm or less and reformed region pattern is formed in an internal portion of the crystalline film.
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