RESONANT MATERIAL LAYER APPARATUS, METHOD AND APPLICATIONS

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United States of America Patent

APP PUB NO 20130062104A1
SERIAL NO

13606124

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A resonant structure and a method for fabricating the resonant structure each include a substrate that includes at least one cavity. The resonant structure and the method for fabricating the resonant structure also include a resonant material layer located and formed over the substrate and at least in-part covering the at least one cavity. The resonant structure may comprise a graphene resonator structure.

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Patent Owner(s)

Patent OwnerAddress
CORNELL UNIVERSITY395 PINE TREE ROAD SUITE 310 ITHACA NY 14850

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alden, Jonathan S Ithaca, US 7 520
Barton, Robert A Ithaca, US 8 304
Craighead, Harold G Ithaca, US 114 5166
Ilic, Bojan R Ithaca, US 3 12
McEuen, Paul Ithaca, US 5 28
Park, Jiwoong Ithaca, US 35 160
Parpia, Jeevak M Ithaca, US 14 101
Ruiz-Vargas, Carlos S Ithaca, US 1 11
van, der Zande Arend M Ithaca, US 1 11

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