METHOD OF FABRICATING POROUS FILM STRUCTURE USING DRY PROCESSES AND POROUS FILM STRUCTURES FABRICATED BY THE SAME

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United States of America Patent

APP PUB NO 20130052475A1
SERIAL NO

13589416

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Abstract

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Provided are a method of fabricating a porous thin film structure, by forming a thin film from at least two elements, followed by selectively removing the certain element using a dry etching process, and a porous thin film structure fabricated by the same. Because all processes of the method of fabricating a porous thin film structure are dry processes, process control is simply accomplished, environmental impact is low, and mass production is possible, in contrast to when using a typical wet process such as electrodeposition or dealloying. Also, since a level of porosity is easily controlled and maintained uniform, a mesoporous thin film structure showing a reproducible level of sensitivity when used as a sensor can be fabricated.

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KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY5 HWARANG-RO 14-GIL SEONGBUK-GU SEOUL 02792 02792

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  • 2012 Application Filing Year
  • C22C Class
  • 982 Applications Filed
  • 876 Patents Issued To-Date
  • 89.21 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2012201320142015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BYUN, Ji Young Seoul, KR 26 38
CHOI, Jeong Beom Gyeonggi-Do, KR 1 8
HA, Heon Phil Seoul, KR 16 21
KIM, Do Hyung Seoul, KR 279 2748
KIM, Sang Hoon Gyeonggi-Do, KR 236 1246
LIM, Chae Sun Incheon, KR 2 8

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  • 8 Citation Count
  • C22C Class
  • 13.08 % this patent is cited more than
  • 12 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges341952163101 - 1011 - 2021 - 3041 - 5051 - 600102030405060708090100110120130140150160170180190200210

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