MULTI-BEAM EXPOSURE SCANNING METHOD AND APPARATUS AND PRINTING PLATE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
Feb 28, 2013
app pub date -
Aug 24, 2012
filing date -
Aug 26, 2011
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Abandoned
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Abstract
A multi-beam exposure scanning method includes: simultaneously emitting a plurality of beams with an interval between scanning lines toward a recording medium; and performing engraving on a surface of the recording medium by performing exposure scanning a plurality of times with a same scanning line, the method further includes: repeatedly performing interlaced exposure using a beam group with an interval between adjacent beams N times (N is an integer equal to 2 or more) larger than the interval between the scanning lines N×m times (m is an integer equal to 2 or more) on a first area surrounding a flat-shaped target area to be left on the surface, to expose each of the scanning lines m times; and performing non-interlaced exposure using a beam group with an interval between adjacent beams equal to the interval between the scanning lines on a second area, which is outside the first area.
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