METHOD FOR MAKING A SEMICONDUCTOR DEVICE BY LASER IRRADIATION
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United States of America Patent
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Issued Date -
Feb 21, 2013
app pub date -
Dec 9, 2010
filing date -
Dec 15, 2009
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Abandoned
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Abstract
A method for making a semiconductor device including the steps of exposing a semiconductor substrate to a process step or sequence of process steps of which at least one process performance parameter is determined in a region of the semiconductor substrate, and irradiating the region with a laser having laser irradiation parameters; wherein the irradiation parameters are determined based on the at least one process performance parameter.
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