METHOD AND APPARATUS FOR IMAGE PLANE EXIT PUPIL CHARACTERIZATION
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United States of America Patent
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Issued Date -
Feb 21, 2013
app pub date -
Aug 17, 2011
filing date -
Aug 17, 2011
priority date (Note) -
Abandoned
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Abstract
An aperture mask for image plane exit pupil characterization of an imaging system is disclosed. The aperture mask includes a substantially opaque sheet configured to block portions of a wavefront travelling through an optical path of the imaging system, the sheet includes a plurality of holes, wherein the holes are positioned relative to each other such that a hole-to-hole distance generates a unique spatial frequency signature in the imaging system's point spread function.
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