POLYACRYLIC ACID (SALT), POLYACRYLIC ACID (SALT)-BASED WATER-ABSORBING RESIN, AND PROCESS FOR PRODUCING SAME

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United States of America Patent

APP PUB NO 20130043384A1
SERIAL NO

13643506

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Abstract

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A polyacrylic acid (salt), or a polyacrylic acid (salt)-based water-absorbing resin, contains a tracer for detecting various troubles in the water-absorbing resin during the period from the production of the water-absorbing resin to the use and discard thereof by a consumer. The polyacrylic acid (salt)-based water-absorbing resin has a stable carbon isotope ratio, as determined by accelerator mass spectrometry, of less than −20% and a radioactive carbon content of 1.0×10−14 or mole. The polyacrylic acid (salt)-based water-absorbing resin has: a CRC of 10 [g/g] or mole; an AAP of 20 [g/g] or mole; an Ext of 35 wt. % or less; a content of residual monomers of 1,000 ppm or less; a PSD in which the proportion of particles having a particle diameter of 150 μm or larger but less than 850 μm is 90 wt. % or more; and an FSR of 0.15 [g/g/s] or more.

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Patent Owner(s)

Patent OwnerAddress
NIPPON SHOKUBAI CO LTD1-1 KORAIBASHI 4-CHOME CHUO-KU OSAKA-SHI OSAKA 541-0043

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Yoshifumi Hyogo, JP 33 668
Ishizaki, Kunihiko Hyogo, JP 116 2443
Matsumoto, Satoshi Hyogo, JP 209 1933
Miura, Yuki Hyogo, JP 30 232

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