ANTI MICROBIAL COMPOUNDS AND THEIR USE
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United States of America Patent
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Issued Date -
Feb 14, 2013
app pub date -
Nov 19, 2010
filing date -
Nov 19, 2009
priority date (Note) -
Abandoned
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Abstract
Compounds having building blocks according to the general formulae as shown in FIG. 1., wherein [BB1] is building block 1; [BB2] is building block 2; R1 is H or CH3, Z is a bridging group and is an ester group (—C(═O)O—) or an amide group (—C(═O)—NH—), X is an element selected from nitrogen, phosphorus, oxygen and sulfur; i is an integer which is 2 in case of nitrogen and phosphorus and 1 in case of oxygen and sulfur; Rj denotes groups which may be the same or different and have a C1-C20 hydrocarbyl group; Rk is a C7-C50 hydrocarbyl group; Y− is a negatively charged ion; and wherein the molar fraction of [BB2] in a molecule of the compound is between 0.3 and 1 and the weight average molecular weight of the compound is between 1.000 and 100.000 g/mol, determined with GPC. Compositions comprising such compounds and the use of such compounds as surfactants in a method for coating objects and in a method for preparing a latex composition.
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