Plasma Supply Arrangement Having Quadrature Coupler
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United States of America Patent
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app pub date -
Sep 11, 2012
filing date -
Mar 11, 2010
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Abstract
A plasma supply arrangement for supplying power to a plasma load has a quadrature coupler which has at least one capacitance and at least one inductivity and which is suitable for coupling together two HF power signals of the same frequency which are phase-shifted relative to each other by 90°, an HF power signal being supplied respectively at a first useful signal connection and at a second useful signal connection of the quadrature coupler as a useful signal, to form a coupled HF power which can be output as a useful signal at a third useful signal connection, at least one useful signal connection being configured for a first impedance. The quadrature coupler has a fourth useful signal connection which is configured for a second impedance which is higher than the first impedance, or has only three useful signal connections.
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