POLYACRYLIC ACID (SALT), POLYACRYLIC ACID (SALT)-BASED WATER-ABSORBING RESIN, AND PROCESS FOR PRODUCING SAME

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United States of America Patent

APP PUB NO 20130037708A1
SERIAL NO

13643498

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Abstract

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Disclosed are a polyacrylate (salt) and a polyacrylate (salt) water-absorbent resin containing a tracer which can be verified back to the manufacturing process of the water-absorbent resin when dealing with various problems with the water-absorbent resin which can occur from the manufacturing process of the water-resistant resin, during the use thereof by a consumer, up until the disposal thereof. The disclosed polyacrylate (salt) and the polyacrylate (salt) water-absorbent resin have a carbon stable isotope ratio (δ13C) of at least −20% when measured by accelerator mass spectrometry.

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Patent Owner(s)

Patent OwnerAddress
NIPPON SHOKUBAI CO LTD1-1 KORAIBASHI 4-CHOME CHUO-KU OSAKA-SHI OSAKA 541-0043

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishizaki, Kunihiko Hyogo, JP 116 2443
Matsumoto, Satoshi Hyogo, JP 209 1933
Miura, Yuki Hyogo, JP 30 232
Sakamoto, Shigeru Hyogo, JP 129 1976

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