OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS

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United States of America Patent

APP PUB NO 20130022785A1
SERIAL NO

13528314

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention discloses diblock copolymer systems that self-assemble to produce very small structures. These co-polymers consist of one block that contains silicon and another block comprised of an oligosaccharide that are coupled by azide-alkyne cycloaddition.

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Patent Owner(s)

Patent OwnerAddress
BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM210 WEST 7TH STREET AUSTIN TX 78701

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bates, Christopher M Austin, US 27 388
Borsali, Redouane Grenoble-Saint Martin d'Hares, FR 2 46
Cushen, Julia Austin, US 10 164
Easley, Jeffery Alan Austin, US 1 36
Ellison, Christopher John Austin, US 15 174
Fort, Sebastien Grenoble-Saint Martin d'Hares, FR 10 184
Halila, Sami Beaucroissant, FR 6 192
Otsuka, Issei Grenoble, FR 3 50
Willson, C Grant Austin, US 38 2016

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