CLEANING METHOD AND SYSTEM FOR A VACUUM PUMP
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United States of America Patent
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Issued Date -
Jan 24, 2013
app pub date -
Jul 18, 2012
filing date -
Jul 19, 2011
priority date (Note) -
Abandoned
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Abstract
The invention relates to a method for cleaning a vacuum pump embedded in a technical system. Water is provided for the cleaning, and a rotational speed of the vacuum pump is adjusted to a value in a cleaning rotational speed range. A defined amount of cold water and/or warm water is supplied to the vacuum pump and the vacuum pump is rinsed with the water during a predetermined time period. After letting the water escape from the vacuum pump, the vacuum pump is dried by aeration with gas or a gas mixture. The invention also relates to a cleaning system for cleaning the vacuum pump.
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