System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
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United States of America Patent
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Issued Date -
Jan 10, 2013
app pub date -
Sep 14, 2012
filing date -
Feb 22, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
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