COCRPT-BASED ALLOY SPUTTERING TARGETS WITH COBALT OXIDE AND NON-MAGNETIC OXIDE AND MANUFACTURING METHODS THEREOF
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United States of America Patent
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Issued Date -
Jan 10, 2013
app pub date -
Jul 8, 2011
filing date -
Jul 8, 2011
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Abstract
Provided is a CoCrPt-based alloy sputtering target containing cobalt (Co), chromium (Cr), platinum (Pt), cobalt oxide and non-magnetic oxide composition, wherein the lengths of ceramic phases of Cr2O3 and Co(Cr)—X—O formed in the sputtering targets are respectively less than 3 μm (“X” represents the metal element of the non-magnetic oxide). The sputtering target is obtained via controlling suitable composition proportion of the prealloy powder with Cr and the sintering factor to decrease the size of ceramic phases of Cr2O3 and Co(Cr)—X—O. Sputtering targets made by the methods of the present invention decrease the arcing effects and unnecessary formation of particles upon sputtering in addition to making the components of the sputtering targets distribute more uniformly therein.
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