SELF-SUPPORTING FILM, SELF-SUPPORTING STRUCTURE, METHOD FOR MANUFACTURING SELF-SUPPORTING FILM, AND PELLICLE

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United States of America Patent

APP PUB NO 20130004711A1
SERIAL NO

13634337

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Abstract

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Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 μm to 20.0 μm. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.

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Patent Owner(s)

Patent OwnerAddress
ASAHI KASEI E-MATERIALS CORPORATION1-105 KANDA JINBOCHO CHIYODA-KU TOKYO 101-8101

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Doi, Seitaro Chiyoda-ku, JP 2 15
Iwamura, Kenichiro Chiyoda-ku, JP 2 15
Namatame, Takuji Chiyoda-ku, JP 5 183

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