Laser exposure method and product
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United States of America Patent
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Feb 24, 2015
Grant Date -
Dec 27, 2012
app pub date -
May 23, 2011
filing date -
Jun 4, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
Provided are a high-resolution laser exposure method and a product manufactured with use of the laser exposure method, the laser exposure method being capable of performing high-resolution laser plate-making in gravure plate-making, offset plate-making, flexo plate-making, and the like, and being usable in laser exposure of a circuit pattern in an electronic component such as a printed circuit board, a liquid crystal display, and a plasma display, or in special printing for prevention of forgery of banknotes and the like. The laser exposure method, which uses a laser exposure apparatus, includes: scanning laser beams to form a laser spot array having a predetermined length on a photosensitive film; and exposing the photosensitive film coated on a plate surface to light, to thereby form a photosensitized part and a non-photosensitized part. The scanning includes sequentially scanning, for exposure, a subsequent laser spot array so that at least a half region of a previously scanned laser spot array in a width direction thereof is subjected to superimposed exposure.
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