METHOD TO SOLVE POTENTIAL YIELD LOSS DUE TO METAL MIGRATION TO WIRE ROUTING NETS FROM FIDUCIARY MARKS ON PRODUCT DURING CHEMICAL-MECHANICAL-POLISHING (CMP) PLANARIZATION PROCESSING STEPS
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United States of America Patent
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Issued Date -
Dec 27, 2012
app pub date -
Jun 23, 2011
filing date -
Jun 23, 2011
priority date (Note) -
Abandoned
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Abstract
A mask for a semiconductor process step includes an indicia section. The indicia section on the mask is used to produce a field of separated polygon elements with a defined negative space in the field providing an indicia.
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