Methods and Systems For Controlling SiIicon Rod Temperature
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United States of America Patent
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Issued Date -
Dec 20, 2012
app pub date -
Jun 11, 2012
filing date -
Jun 14, 2011
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Abandoned
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Abstract
Systems and methods are provided for controlling silicon rod temperature. In one example, a method of controlling a surface temperature of at least one silicon rod in a chemical vapor deposition (CVD) reactor during a CVD process is presented. The method includes determining an electrical resistance of the at least one silicon rod, comparing the resistance to a set point to determine a difference, and controlling a power supply to control a power output coupled to the at least one silicon rod to minimize an absolute value of the difference.
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