Surface Plasma Gas Processing
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United States of America Patent
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Issued Date -
Sep 23, 2010
app pub date -
Jan 6, 2010
filing date -
Jul 6, 2007
priority date (Note) -
Abandoned
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Abstract
The invention relates to a gas processing unit adapted for generating a surface plasma in the vicinity of a photocatalyst, that has a planar configuration. The photocatalyst is deposited in the form of a thin layer on a dielectric substrate and at least one plasma supply electrode is formed above the photocatalyst thin layer. Such a configuration increases the interaction between the plasma and the photocatalyst. The unit can be used for a gas processing of the pollution-control, odour reduction or bactericidal treatment type with a high efficiency.
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