POLISHING PAD AND METHOD OF PRODUCING THE SAME
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United States of America Patent
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Jul 23, 2012
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Sep 16, 2010
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Abstract
The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a plurality of bundles of first long fibers and an elastomer embedded into the bundles. The bundles of first long fibers are entangled with each other.
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