ELECTROLESS PLATING APPARATUS, METHOD OF ELECTROLESS PLATING, AND MANUFACTURING METHOD OF PRINTED CIRCUIT BOARD

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United States of America Patent

APP PUB NO 20120295013A1
SERIAL NO

13461853

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An electroless plating solution is accommodated in a plating tank of an electroless plating apparatus. A reference electrode and a counter electrode are immersed in the electroless plating solution. A conductive member is provided to be electrically in contact with a conductive portion of a long-sized substrate. The conductive member, the reference electrode, and the counter electrode are connected to a potentiostat. A main control device controls the potential of the conductive portion of the long-sized substrate by a potentiostat such that the potential of the conductive portion of the long-sized substrate with respect to a potential of the reference electrode is equal to a potential of the independent portion of the long-sized substrate with respect to the potential of the reference electrode.

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Patent Owner(s)

Patent OwnerAddress
NITTO DENKO CORPORATION1-2 SHIMO-HOZUMI 1-CHOME IBARAKI-SHI OSAKA 567-8680

International Classification(s)

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  • 2012 Application Filing Year
  • B05C Class
  • 565 Applications Filed
  • 339 Patents Issued To-Date
  • 60 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2012201320142015201620172018201920200255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
TSUNEKAWA, Makoto Osaka, JP 16 84

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  • 1 Citation Count
  • B05C Class
  • 10.86 % this patent is cited more than
  • 13 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3320041158123101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7081 - 900102030405060708090100110120130140150160170180190200210

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