REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS
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United States of America Patent
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app pub date -
Jul 11, 2012
filing date -
Aug 24, 2007
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Abandoned
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Abstract
A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
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