HEATING SYSTEM FOR A VAPOR-PHASE DEPOSITION SOURCE
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United States of America Patent
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Issued Date -
Nov 15, 2012
app pub date -
Feb 15, 2011
filing date -
Feb 16, 2010
priority date (Note) -
Abandoned
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Abstract
A vapor-phase deposition source includes a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and elements for heating the material placed in the receptacle. The second is a diffusion zone having a vessel communicating with the production zone and equipped with at least one orifice so that the vapor-phase material is transmitted towards the exterior of the vessel through the orifice. The source is characterized in that, on the one hand, the room includes an inner wall and an outer envelope defining an intermediate space filled with a heat-transporting liquid and, on the other, it is equipped with elements for heating the coolant.
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