CONSTANT VOLUME CLOSURE VALVE FOR VAPOR PHASE DEPOSITION SOURCE
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United States of America Patent
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Issued Date -
Nov 15, 2012
app pub date -
Feb 15, 2011
filing date -
Feb 16, 2010
priority date (Note) -
Abandoned
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Abstract
A vapor-phase deposition source including a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and element for heating the material placed in the receptacle. The second is a diffusion zone including a vessel communicating with the production zone and equipped with at least one opening so that the vapor-phase material is transmitted towards the exterior of the vessel through the opening. The source is characterized in that it includes elements for closing the orifice and elements for moving the closing elements between an active closed position and an orifice open position without changing the volume of the diffusion zone.
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