METHODS AND SUBSTRATES FOR LASER ANNEALING
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United States of America Patent
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Issued Date -
Nov 8, 2012
app pub date -
Jul 6, 2011
filing date -
May 2, 2011
priority date (Note) -
Abandoned
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Abstract
Methods and substrates for laser annealing are disclosed. The substrate includes a target region to be annealed and a plurality of reflective interfaces. The reflective interfaces cause energy received by the substrate to resonate within the target region. The method includes emitting energy toward the substrate with a laser, receiving the energy with the substrate, and reflecting the received energy with a plurality of reflective interfaces embedded in the substrate to generate a resonance within the target region.
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